ELPHY Plus 6.9

ELPHY Plus by Raith GmbH is an add-on nanolithography platform that transforms compatible scanning electron microscopes (SEMs) and focused ion beam (FIB) systems into precise, direct-write patterning tools. Combining high-speed pattern generator hardware with robust control software, it enables accurate beam steering, alignment, and automated exposure workflows for research and prototyping at the nanoscale—without sacrificing the microscope’s native imaging capabilities.

Key capabilities

• Seamless integration with a wide range of SEM and FIB instruments to enable electron- or ion-beam lithography on existing tools
• CAD-to-pattern workflow with import of common layout formats (e.g., GDSII, DXF) and support for hierarchical designs
• Fine-grained control of exposure parameters, including dose and dwell-time modulation, with options for proximity effect compensation
• Advanced alignment and overlay to existing structures using image-based mark detection
• Drift compensation, write-field calibration, and stitching for large-area or high-precision patterning
• Flexible exposure strategies (vector and raster) and recipe-based automation for repeatable results
• Live imaging and post-exposure verification within the same environment
• User management, job queuing, and data logging to support shared-lab and production workflows

Typical applications

• Rapid prototyping of nanodevices in photonics, quantum technologies, MEMS/NEMS, plasmonics, and nanoelectronics
• Overlay patterning on pre-structured wafers and samples
• Research, process development, and low-volume fabrication

Benefits

• Extends the capability of existing microscopes, reducing the need for dedicated standalone writers
• Shortens time from design to exposure with an intuitive, streamlined workflow
• Delivers reliable, high-resolution patterning suitable for both academic and industrial environments

Compatibility and support

• Works with many leading SEM and FIB platforms; specific configurations and interfaces depend on the host system
• Windows-based control software paired with dedicated pattern generator hardware
• Backed by Raith’s global training, applications support, and service

For detailed specifications, supported microscope models, and configuration options, contact Raith GmbH or your local Raith representative.

ELPHY Plus is developed by Raith GmbH. The most popular versions of this product among our users are: 4.0, 5.5, 6.0, 6.1 and 6.9. The name of the program executable file is Elphy32.EXE.

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